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arXiv · 0910.1058

A model of the reflection distribution in the vacuum ultra violet region

C. Silva·J. Pinto da Cunha·A. Pereira·M. I. Lopes·V. Chepel·V. Solovov·F. Neves
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Abstract

A reflection model with three components, a specular spike, a specular lobe and a diffuse lobe is discussed. This model was successfully applied to describe reflection of xenon scintillation light (175 nm) by PTFE and other fluoropolymers and can be used for Monte Carlo simulation and analysis of scintillation detectors. The measured data favors a Trowbridge-Reitz distribution function of ellipsoidal micro-surfaces. The intensity of the coherent reflection increases with increasing angle of incidence, as expected, since the surface appears smoother at grazing angles. The total reflectance obtained for PTFE is about 70% for VUV light at normal incidence in vacuum and estimated to be up to 100% in contact with liquid xenon.

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C. Silva, J. Pinto da Cunha, A. Pereira, M. I. Lopes, V. Chepel, V. Solovov, F. Neves. 2009-10-06. A model of the reflection distribution in the vacuum ultra violet region. https://doi.org/10.1016/j.nima.2009.10.086

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