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arXiv · 1310.6578

Towards wafer scale inductive determination of magnetostatic and dynamic parameters of magnetic thin films and multilayers

Sibylle Sievers·Niklas Liebing·Paul Nass·Santiago Serrano-Guisan·Massimo Pasquale·Hans Werner Schumacher
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Abstract

We investigate an inductive probe head suitable for non-invasive characterization of the magnetostatic and dynamic parameters of magnetic thin films and multilayers on the wafer scale. The probe is based on a planar waveguide with rearward high frequency connectors that can be brought in close contact to the wafer surface. Inductive characterization of the magnetic material is carried out by vector network analyzer ferromagnetic resonance. Analysis of the field dispersion of the resonance allows the determination of key material parameters such as the saturation magnetization MS or the effective damping parameter Meff. Three waveguide designs are tested. The broadband frequency response is characterized and the suitability for inductive determination of MS and Meff is compared. Integration of such probes in a wafer prober could in the future allow wafer scale in-line testing of magnetostatic and dynamic key material parameters of magnetic thin films and multilayers.

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Sibylle Sievers, Niklas Liebing, Paul Nass, Santiago Serrano-Guisan, Massimo Pasquale, Hans Werner Schumacher. 2013-10-24. Towards wafer scale inductive determination of magnetostatic and dynamic parameters of magnetic thin films and multilayers. https://doi.org/10.1109/tmag.2012.2219512

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