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arXiv · 1604.04094

Tailoring reflection of graphene plasmons by focused ion beams

Weiwei Luo·Wei Cai·Wei Wu·Yinxiao Xiang·Mengxin Ren·Xinzheng Zhang·Jingjun Xu
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Abstract

Graphene plasmons are of remarkable features that make graphene plasmon elements promising for applications to integrated photonic devices. The fabrication of graphene plasmon components and control over plasmon propagating are of fundamental important. Through near-field plasmon imaging, we demonstrate controllable modifying of the reflection of graphene plasmon at boundaries etched by ion beams. Moreover, by varying ion dose at a proper value, nature like reflection boundary can be obtained. We also investigate the influence of ion beam incident angle on plasmon reflection. To illustrate the application of ion beam etching, a simple graphene wedge-shape plasmon structure is fabricated and performs excellently, proving this technology as a simple and efficient tool for controlling graphene plasmons.

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Weiwei Luo, Wei Cai, Wei Wu, Yinxiao Xiang, Mengxin Ren, Xinzheng Zhang, Jingjun Xu. 2016-04-14. Tailoring reflection of graphene plasmons by focused ion beams. https://arxiv.org/abs/1604.04094

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