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arXiv · 1901.11062

Rigorous Analytical Model for Metasurface Microscopic Design with Interlayer Coupling

Abstract

We present a semianalytical method for designing meta-atoms in multilayered metasurfaces (MSs), relying on a rigorous model developed for multielement metagratings. Notably, this model properly accounts for near-field coupling effects, allowing reliable design even for extremely small interlayer spacings, verified via commercial solvers. This technique forms an appealing alternative to the common full-wave optimization employed for MS microscopic design to date.

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Shahar Levy, Yaniv Kerzhner, Ariel Epstein. 2019-01-30. Rigorous Analytical Model for Metasurface Microscopic Design with Interlayer Coupling. https://arxiv.org/abs/1901.11062

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