Search arXiv⌕ Search
Home/Archive/arXiv

arXiv · 2007.14170

A Novel Compact Si-B-N Barrier on Mg-Li Alloys via Plasma Treatment

Y. Chen·J. K. Gao·X. D. Zhu
View original source ↗Read source document ↗Export metadata ↓

Abstract

Mg-Li alloys have attracted much attention due to their superior properties. However, it is a great challenge to improve their inferior oxidation and corrosion resistance. We report a novel Si-B-N ceramic film deposited on the Mg-9.6Li alloy surface as an effective barrier against oxidation and corrosion. The films were deposited by using plasma enhanced chemical vapor deposition from a N2-B2H6-SiH4 gas mixtures, showing compact structure and adhesive attachment to the alloy surface. The barrier revealed excellent protection against oxidation in humid air for 500 days, and no observable changes were found in immersion test of the 3.5 wt.% NaCl solution for 10 min. The superior oxidation and corrosion resistance are attributed to the excellent material property of Si-B-N coatings with compact structure via plasma treatment. Moreover, it is found that moderate proportion of B_2 H_6 in the source gas mixture is beneficial to the protection of alloys, where the hydrogen release reaction nearly disappeared and no bubbles were generated on the surface in the immersion test.

Explore related subjects

physics.app-ph

Keep this discovery

Explore connections, maps & timelines

BibTeXRIS

Y. Chen, J. K. Gao, X. D. Zhu. 2020-07-28. A Novel Compact Si-B-N Barrier on Mg-Li Alloys via Plasma Treatment. https://arxiv.org/abs/2007.14170

Cite the original work for its findings. Save a collection to share your selection of sources.

KEEP EXPLORING

Related papers

arXiv2026

Measuring vacancy-type defect density in monolayer semiconductors

Two-dimensional (2D) materials have attracted wide-spread interest due to their unique and tunable properties. Their optoelectronic, mechanical, and thermal properties are greatly influenced by crystal defects, which are, in turn, used to control these properties. However, experimental quantification of the density of defects, whether deliberately introduced or inherent, is very difficult in these atomically thin materials. Here we show that helium atom micro-diffraction can be used to measure the defect density in ~15x20um monolayer MoS2, a prototypical 2D semiconductor, quickly and easily compared to standard methods. We present a simple analytic model, the lattice gas equation, that captures the relationship between atomic Bragg diffraction intensity and defect density. The model, combined with ab initio scattering calculations, shows that our technique can immediately be applied to a wide range of 2D materials, independent of sample chemistry or structure. Additionally, wafer-scale characterization is immediately possible.

physics.app-ph↗
arXiv2026

Compact Modeling of Oxide-Semiconductor, 2D Material, Carbon Nanotube, and Cryogenic Transistors with Experiment Verification

This paper presents a unified compact model for emerging transistor technologies, including oxide-semiconductor field-effect transistors (OSFETs), 2D material FETs (2DFETs), carbon nanotube FETs (CNFETs), and cryogenic MOSFETs. A unified charge-density formulation is developed to account for quantum confinement, trap charges, and band-tail states in channel charge calculations. A physics-based transport model is introduced to seamlessly capture carrier transport from the long-channel diffusive regime to the short-channel ballistic limit. Scaling models are incorporated to accurately describe 2D electrostatic effects. Cryogenic operation is modeled through the inclusion of band-tail states and temperature-dependent mobility and threshold voltage. The proposed model is validated against experimental data from the fabricated OSFETs with multiple channel lengths and published measurements of 2DFETs, CNFETs, and cryogenic MOSFETs. Excellent agreement is demonstrated across diverse device architectures, operating conditions, and material systems.

physics.app-ph↗
arXiv2026

Multiplexing approaches to thermoradiative signatureless communications

Using mid-infrared emission from semiconductor devices for covert communications remains a relatively unexplored and yet promising opportunity. The phenomenon of negative luminescence allows for a method of signatureless covert communications where the net infrared emission of an emitting optoelectronic device is balanced to be identical to the ambient thermal background. In this work we provide a practical demonstration of covert data transfer over a thermoradiative channel with data rates up to 100 kbps. In addition, we demonstrate several additional multiplexing techniques that make the proposed thermoradiative communications method more secure against interception by achieving zero instantaneous optical emission, while remaining detectable if a sufficiently spatially or spectrally discerning observation is utilised. Finally, we discuss various application scenarios in which the proposed methods can be used to achieve secure signatureless communications.

physics.app-ph↗