arXiv · 2209.04545
Low-temperature electron mobility in doped semiconductors with high dielectric constant
Abstract
We propose and study theoretically a new mechanism of electron-impurity scattering in doped seminconductors with large dielectric constant. It is based upon the idea of \textit{vector} character of deformations caused in the crystalline lattice by any point defects siting asymmetrically in the unit cell. In result, local lattice compression due to the elastic deformations decay as $1/r^2$ with distance from impurity. Electron scattering (due to standard deformation potential) on such defects leads to low-temperature mobility $\mu(n)$ scaling with electron density $n$ of the form $\mu(n) \propto n^{-2/3}$ that is close to experimental observations on a number of relevant materials.
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Khachatur G. Nazaryan, Mikhail Feigel'man. 2022-09-09. Low-temperature electron mobility in doped semiconductors with high dielectric constant. https://arxiv.org/abs/2209.04545
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