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arXiv · 2212.08621

Digital Pixel Test Structures implemented in a 65 nm CMOS process

Abstract

The ALICE ITS3 (Inner Tracking System 3) upgrade project and the CERN EP R&D on monolithic pixel sensors are investigating the feasibility of the Tower Partners Semiconductor Co. 65 nm process for use in the next generation of vertex detectors. The ITS3 aims to employ wafer-scale Monolithic Active Pixel Sensors thinned down to 20 to 40 um and bent to form truly cylindrical half barrels. Among the first critical steps towards the realisation of this detector is to validate the sensor technology through extensive characterisation both in the laboratory and with in-beam measurements. The Digital Pixel Test Structure (DPTS) is one of the prototypes produced in the first sensor submission in this technology and has undergone a systematic measurement campaign whose details are presented in this article. The results confirm the goals of detection efficiency and non-ionising and ionising radiation hardness up to the expected levels for ALICE ITS3 and also demonstrate operation at +20 C and a detection efficiency of 99% for a DPTS irradiated with a dose of $10^{15}$ 1 MeV n$_{\mathrm{eq}}/$cm$^2$. Furthermore, spatial, timing and energy resolutions were measured at various settings and irradiation levels.

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Gianluca Aglieri Rinella, Anton Andronic, Matias Antonelli, Mauro Aresti, Roberto Baccomi, Pascal Becht, Stefania Beole, Justus Braach, Matthew Daniel Buckland, Eric Buschmann, Paolo Camerini, Francesca Carnesecchi, Leonardo Cecconi, Edoardo Charbon, Giacomo Contin, Dominik Dannheim, Joao de Melo, Wenjing Deng, Antonello di Mauro, Jan Hasenbichler, Hartmut Hillemanns, Geun Hee Hong, Artem Isakov, Antoine Junique, Alex Kluge, Artem Kotliarov, Filip Křížek, Lukas Lautner, Magnus Mager, Davide Marras, Paolo Martinengo, Silvia Masciocchi, Marius Wilm Menzel, Magdalena Munker, Francesco Piro, Alexandre Rachevski, Karoliina Rebane, Felix Reidt, Roberto Russo, Isabella Sanna, Valerio Sarritzu, Serhiy Senyukov, Walter Snoeys, Jory Sonneveld, Miljenko Šuljić, Peter Svihra, Nicolas Tiltmann, Gianluca Usai, Jacob Bastiaan Van Beelen, Mirella Dimitrova Vassilev, Caterina Vernieri, Anna Villani. 2023-07-10. Digital Pixel Test Structures implemented in a 65 nm CMOS process. https://doi.org/10.1016/j.nima.2023.168589

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