arXiv · 2303.00166
Ultra-high-speed high-resolution laser lithography for lithium niobate integrated photonics
Abstract
Photolithography assisted chemo-mechanical etching (PLACE), a technique specifically developed for fabricating highquality large-scale photonic integrated circuits (PICs) on thin-film lithium niobate (TFLN), has enabled fabrication of a series of building blocks of PICs ranging from high-quality (high-Q) microresonators and low-loss waveguides to electrooptically (EO) tunable lasers and waveguide amplifiers. Aiming at high-throughput manufacturing of the PIC devices and systems, we have developed an ultra-high-speed high-resolution laser lithography fabrication system employing a high repetition rate femtosecond laser and a high-speed polygon laser scanner, by which a lithography fabrication efficiency of 4.8 cm2/h has been achieved at a spatial resolution of 200 nm. We demonstrate wafer-scale fabrication of TFLN-based photonic structures, optical phase masks as well as color printing
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Jinming Chen, Zhaoxiang Liu, Lvbin Song, Chao Sun, Guanhua Wang, Ya Cheng. 2023-03-01. Ultra-high-speed high-resolution laser lithography for lithium niobate integrated photonics. https://arxiv.org/abs/2303.00166
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