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arXiv · 2407.09208

Fabrication of low-loss lithium niobate on insulator waveguides on the wafer scale

Mohammadreza Younesi·Thomas Kasebier·Ilia Elmanov·Yang-Teng Li·Pawan Kumar·Reinhard Geiss·Thomas Siefke·Falk Eilenberger·Frank Setzpfandt·Uwe Zeitner·Thomas Pertsch
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Abstract

We report on the wafer scale fabrication of single mode low-loss lithium niobate on insulator waveguides utilizing a chemically amplified resist and an optimized dry etching method. The fabricated single mode waveguides are free of residuals and re-deposition, with measured losses for straight waveguides around 2 dB/m (0.02 dB/cm). We present on a method offering advantages for large-scale production due to its cost-effectiveness, faster writing time, and simplified processes. This work holds promise for advancing integrated photonics and optical communication technologies.

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Mohammadreza Younesi, Thomas Kasebier, Ilia Elmanov, Yang-Teng Li, Pawan Kumar, Reinhard Geiss, Thomas Siefke, Falk Eilenberger, Frank Setzpfandt, Uwe Zeitner, Thomas Pertsch. 2024-07-12. Fabrication of low-loss lithium niobate on insulator waveguides on the wafer scale. https://arxiv.org/abs/2407.09208

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