Search arXivSearch

arXiv · 2607.03077

Complex Refractive Index Determination via Microspectroscopy Through Magnifying Optics: Challenges and Opportunities

Abstract

For the design and optimization of optoelectronic devices, accurate knowledge of the complex refractive indices of the constituent materials is essential. Herein, we present a fast and non-destructive approach for the extraction of the refractive indices from reflectance and transmittance spectra of samples with lateral dimensions down to the micrometer scale. Microspectroscopy, based on the combination of a standard optical microscope and a spectrometer, enables the assessment of the optical response of multilayer stacks using high-magnification optics with correspondingly large numerical apertures. Employing a numerical formalism explicitly accounting for the influence of the numerical aperture, allows for precise retrieval of the refractive index without resorting to dispersion models. We demonstrate the applicability of the proposed method for large-area, homogeneous, optically incoherent samples such as transparent glasses and absorbing 4H-SiC, for a SixNy thin film on glass substrate, and for mechanically exfoliated flakes of highly oriented pyrolytic graphite and MoO3, as representatives of uniaxial and biaxial optical anisotropy. While the results prove excellent agreement with values reported in literature, the case of graphite highlights the limitation for probing the out-of-plane refractive indices due to reduced sensitivity. Finally, we discuss possible extensions towards retrieving the full anisotropic tensor of the refractive index, establishing the proposed approach as a methodologically sound alternative to spectroscopic ellipsometry.

Explore related subjects

Keep this discovery

Explore connections, maps & timelines

BibTeXRIS

Julian Schwarz, Johannes Bauer, Mathias Rommel, Andreas Hutzler. 2026-07-03. Complex Refractive Index Determination via Microspectroscopy Through Magnifying Optics: Challenges and Opportunities. https://arxiv.org/abs/2607.03077

Cite the original work for its findings. Save a collection to share your selection of sources.

KEEP EXPLORING

Related papers

Measuring vacancy-type defect density in monolayer semiconductors

Two-dimensional (2D) materials have attracted wide-spread interest due to their unique and tunable properties. Their optoelectronic, mechanical, and thermal properties are greatly influenced by crystal defects, which are, in turn, used to control these properties. However, experimental quantification of the density of defects, whether deliberately introduced or inherent, is very difficult in these atomically thin materials. Here we show that helium atom micro-diffraction can be used to measure the defect density in ~15x20um monolayer MoS2, a prototypical 2D semiconductor, quickly and easily compared to standard methods. We present a simple analytic model, the lattice gas equation, that captures the relationship between atomic Bragg diffraction intensity and defect density. The model, combined with ab initio scattering calculations, shows that our technique can immediately be applied to a wide range of 2D materials, independent of sample chemistry or structure. Additionally, wafer-scale characterization is immediately possible.

physics.app-ph

Compact Modeling of Oxide-Semiconductor, 2D Material, Carbon Nanotube, and Cryogenic Transistors with Experiment Verification

This paper presents a unified compact model for emerging transistor technologies, including oxide-semiconductor field-effect transistors (OSFETs), 2D material FETs (2DFETs), carbon nanotube FETs (CNFETs), and cryogenic MOSFETs. A unified charge-density formulation is developed to account for quantum confinement, trap charges, and band-tail states in channel charge calculations. A physics-based transport model is introduced to seamlessly capture carrier transport from the long-channel diffusive regime to the short-channel ballistic limit. Scaling models are incorporated to accurately describe 2D electrostatic effects. Cryogenic operation is modeled through the inclusion of band-tail states and temperature-dependent mobility and threshold voltage. The proposed model is validated against experimental data from the fabricated OSFETs with multiple channel lengths and published measurements of 2DFETs, CNFETs, and cryogenic MOSFETs. Excellent agreement is demonstrated across diverse device architectures, operating conditions, and material systems.

physics.app-ph

Multiplexing approaches to thermoradiative signatureless communications

Using mid-infrared emission from semiconductor devices for covert communications remains a relatively unexplored and yet promising opportunity. The phenomenon of negative luminescence allows for a method of signatureless covert communications where the net infrared emission of an emitting optoelectronic device is balanced to be identical to the ambient thermal background. In this work we provide a practical demonstration of covert data transfer over a thermoradiative channel with data rates up to 100 kbps. In addition, we demonstrate several additional multiplexing techniques that make the proposed thermoradiative communications method more secure against interception by achieving zero instantaneous optical emission, while remaining detectable if a sufficiently spatially or spectrally discerning observation is utilised. Finally, we discuss various application scenarios in which the proposed methods can be used to achieve secure signatureless communications.

physics.app-ph