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Entangled-State Lithography: Tailoring any Pattern with a Single State

Gunnar Bjork·Luis L. Sanchez-Soto·Jonas Soderholm
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Abstract

We demonstrate a systematic approach to Heisenberg-limited lithographic image formation using four-mode reciprocal binominal states. By controlling the exposure pattern with a simple bank of birefringent plates, any pixel pattern on a $(N+1) \times (N+1)$ grid, occupying a square with the side half a wavelength long, can be generated from a $2 N$-photon state.

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Gunnar Bjork, Luis L. Sanchez-Soto, Jonas Soderholm. 2000-11-17. Entangled-State Lithography: Tailoring any Pattern with a Single State. https://doi.org/10.1103/physrevlett.86.4516

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