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Two-dimensional Nanolithography Using Atom Interferometry

A. Gangat·P. Pradhan·G. Pati·M. S. Shahriar
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Abstract

We propose a novel scheme for the lithography of arbitrary, two-dimensional nanostructures via matter-wave interference. The required quantum control is provided by a pi/2-pi-pi/2 atom interferometer with an integrated atom lens system. The lens system is developed such that it allows simultaneous control over atomic wave-packet spatial extent, trajectory, and phase signature. We demonstrate arbitrary pattern formations with two-dimensional 87Rb wavepackets through numerical simulations of the scheme in a practical parameter space. Prospects for experimental realizations of the lithography scheme are also discussed.

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A. Gangat, P. Pradhan, G. Pati, M. S. Shahriar. 2004-04-28. Two-dimensional Nanolithography Using Atom Interferometry. https://doi.org/10.1103/physreva.71.043606

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