arXiv subjects

Hao Xue

Publications and source records attributed to Hao Xue.

111 records · Page 7Linked to original sources

arXiv2019

Lateral Heterojunction BaTiO3/AlGaN Diodes with >8MV/cm Breakdown Field

In this paper, we report enhanced breakdown characteristics of Pt/BaTiO3/Al0.58Ga0.42N lateral heterojunction diodes compared to Pt/Al0.58Ga0.42N Schottky diodes. BaTiO3, an extreme dielectric constant material, has been used, in this study, as dielectric material under the anode to significantly reduce the peak electric field at the anode edge of the heterojunction diode such that the observed average breakdown field was higher than 8 MV/cm, achieved for devices with anode to cathode spacing less than 0.2 microns. Control Schottky anode devices (Pt/Al0.58Ga0.42N) fabricated on the same sample displayed an average breakdown field around 4 MV/cm for devices with similar dimensions. While both breakdown fields are significantly higher than those exhibited by incumbent technologies such as GaN-based devices, BaTiO3 can enable more effective utilization of the higher breakdown fields available in ultra-wide bandgap materials by proper electric field management. This demonstration thus lays the groundwork needed to realize ultra-scaled lateral devices with significantly improved breakdown characteristics.

physics.app-ph↗

arXiv2019

Compositionally graded contact layers for MOCVD grown high Al-content AlGaN transistors

In this letter, we design and demonstrate an improved MOCVD grown reverse Al-composition graded contact layer to achieve low resistance contact to MOCVD grown ultra-wide bandgap (UWBG) Al0.70Ga0.30N channel metal semiconductor field-effect transistors (MESFETs). Increasing the thickness of the reverse graded layer was found to improve contact layer resistance significantly, leading to contact resistance of 3.3x10^-5 Ohm.cm2. Devices with gate length, LG, of 0.6 microns and source-drain spacing, LSD, of 1.5 microns displayed a maximum current density, IDSMAX, of 635 mA/mm with an applied gate voltage, VGS, of +2 V. Breakdown measurements on transistors with gate to drain spacing, LGD, of 770 nm had breakdown voltage greater than 220 , corresponding to minimum breakdown field of 2.86 MV/cm. This work provides a framework for the design of low resistance contacts to MOCVD grown high Al-content AlxGa1-xN channel transistors.

physics.app-ph↗

arXiv2018

Liquid Epitaxial Growth of Two-dimensional Non-layer structured hybrid Perovskite

The hybrid perovskite CH3NH3PbX3 (X= Cl, Br, I) is a promising material for developing novel optoelectronic devices. Owing to the intrinsic non-layer structure, it remains challenging to synthesize molecularly thin CH3NH3PbX3 with large size. Here, we report a low-cost and highly efficient fabrication route to obtain large-scale single-crystalline 2D CH3NH3PbX3 perovskites on a mica substrate via liquid epitaxy. The 2D perovskite is characterized as 8 nm in thickness and hundreds of micrometers in lateral size. First-principles calculations suggest the strong potassium-halogen interactions at the perovskite/mica interface lower the interface energy of perovskites, driving their fast in-plane growth. Spectroscopic investigations reveal 2D CH3NH3PbBr3 possess small exciton binding energy of 30 meV, allowing a superior visible-light photodetector with a photoresponsivity of 126 A/W and a bandwidth exceeded 80 kHz. These features demonstrate that liquid epitaxy is a bottom-up approach to fabricate the non-layer structured 2D perovskites, which offer a new material platform for the device applications and fundamental investigations.

cond-mat.mtrl-sci↗