Surface-Illuminated Interdigitated Ge-on-Si Avalanche Photodiode With Separated Ge Absorption, Si Multiplication, and Lateral Field Engineering
This work presents a surface-illuminated lateral Ge-on-Si interdigitated separate-absorption-charge-multiplication (SACM) avalanche photodiode for 1550-nm detection. The intrinsic-region spacing, P$^-$ charge-control width, and finger geometry are engineered to suppress high-field penetration toward the Ge/Si heterointerface and localize avalanche multiplication in Si. Simulations show that wider charge-control or intrinsic regions reduce fixed-bias dark current and shift avalanche onset to higher reverse bias. Among the tested structures, the intrinsic-region spacing/P$^-$ charge-control width of 0.5/0.15 $μ$m achieved a peak responsivity of 11.81 A/W at 1550 nm. At a -20 V applied voltage, it exhibited a multiplication gain of 3.796, a 3-dB bandwidth of 7.13 GHz, and a matched-bias gain-bandwidth product of 27.07 GHz. Optical-power-dependent measurements also show avalanche-gain compression consistent with space-charge screening. These results demonstrate effective lateral-field engineering for high-speed, surface-illuminated Ge-on-Si APDs.