arXiv subjects

Luca Vialetto

Publications and source records attributed to Luca Vialetto.

4 recordsLinked to original sources

arXiv2026

From Processing to Functionality: Engineering Accessible Material States in Cu-Embedded SiO$_x$ Memristive Devices

Resistive switching in oxide-based devices is widely governed by stochastic defect processes, yet a predictive link between fabrication conditions and functional behavior remains elusive. Here, we establish a multiscale framework connecting plasma-defined deposition conditions to macroscopic device functionality in sputtered SiO$_x$/Cu/SiO$_x$-based systems. By combining large-scale statistical analysis of more than 50,000 experimentally characterized devices with physics-based plasma and atomistic simulations, we show that device behavior does not emerge from deterministic process-to-performance mappings, but from a probabilistic cascade spanning defect formation, defect-state evolution, and functional-regime emergence. Data-driven clustering reveals a continuous functional state space composed of operational switching types, while inverse modeling identifies the reconstructed oxygen-vacancy density as an effective latent descriptor capturing the combined influence of structural disorder and defect topology. This latent descriptor is strongly coupled to both Cu redistribution and electrical response, linking otherwise hidden material properties to observable device characteristics. Furthermore, macroscopic switching behavior is argued to arise from ensemble integration across spatially heterogeneous subdomains, providing a physical explanation for the pronounced variability of large-area devices. These findings shift the perspective from deterministic defect engineering toward probabilistic defect-state design and establish a physically grounded framework for understanding and controlling functional variability in such oxide-based systems, such as memristive or resistive-switching devices.

cond-mat.mtrl-sci↗

arXiv2024

Wedge-type engineered analog SiO$_\mathrm{x}$/Cu/SiO$_\mathrm{x}$-Memristive Devices for Neuromorphic Applications

This study presents a comprehensive examination of the development of TiN/SiO$_\mathrm{x}$/Cu/SiO$_\mathrm{x}$/TiN memristive devices, engineered for neuromorphic applications using a wedge-type deposition technique and Monte Carlo simulations. Identifying critical parameters for the desired device characteristics can be challenging with conventional trial-and-error approaches, which often obscure the effects of varying layer compositions. By employing an \textit{off-center} thermal evaporation method, we created a thickness gradient of SiO$_\mathrm{x}$ and Cu on a 4-inch wafer, facilitating detailed resistance map analysis through semiautomatic measurements. This allows to investigate in detail the influence of layer composition and thickness on single wafers, thus keeping every other process condition constant. Combining experimental data with simulations provides a precise understanding of the layer thickness distribution and its impact on device performance. Optimizing the SiO$_\mathrm{x}$ layers to be below 12.5 nm, coupled with a discontinuous Cu layer with a nominal thickness lower than 0.6 nm, exhibits analog switching properties with an R$_\mathrm{on}$/R$_\mathrm{off}$ ratio of $>$100, suitable for neuromorphic applications, whereas R $\times$ A analysis shows no clear signs of filamentary switching. Our findings highlight the significant role of carefully choosing the SiO$_\mathrm{x}$ and Cu thickness in determining the switching behavior and provide insights that could lead to the more systematic development of high-performance analog switching components for bio-inspired computing systems.

cond-mat.mes-hall↗

arXiv2023

Particle propagation and electron transport in gases

In this review, we detail the commonality of mathematical intuitions that underlie three numerical methods used for the quantitative description of electron swarms propagating in a gas under the effect of externally applied electric and/or magnetic fields. These methods can be linked to the integral transport equation, following a common thread much better known in the theory of neutron transport than in the theory of electron transport. First, we discuss the exact solution of the electron transport problem using Monte Carlo (MC) simulations. In reality we will progress much further, showing the interpretative role that the diagrams used in quantum theory and quantum field theory can play in the development of MC. Then, we present two methods, the Monte Carlo Flux and the Propagator method, which have been developed at this moment. The first one is based on a modified MC method, while the second shows the advantage of explicitly applying the mathematical idea of propagator to the transport problem.

physics.plasm-ph↗

arXiv2023

Machine learning for advancing low-temperature plasma modeling and simulation

Machine learning has had an enormous impact in many scientific disciplines. Also in the field of low-temperature plasma modeling and simulation it has attracted significant interest within the past years. Whereas its application should be carefully assessed in general, many aspects of plasma modeling and simulation have benefited substantially from recent developments within the field of machine learning and data-driven modeling. In this survey, we approach two main objectives: (a) We review the state-of-the-art focusing on approaches to low-temperature plasma modeling and simulation. By dividing our survey into plasma physics, plasma chemistry, plasma-surface interactions, and plasma process control, we aim to extensively discuss relevant examples from literature. (b) We provide a perspective of potential advances to plasma science and technology. We specifically elaborate on advances possibly enabled by adaptation from other scientific disciplines. We argue that not only the known unknowns, but also unknown unknowns may be discovered due to the inherent propensity of data-driven methods to spotlight hidden patterns in data.

physics.plasm-ph↗