arXiv subjects

P. Daoust

Publications and source records attributed to P. Daoust.

3 recordsLinked to original sources

arXiv2026

Extending Silicon Avalanche Photodetection Beyond $2~\mu$m by Direct GeSn Integration

Silicon avalanche photodiodes provide a technologically mature platform for sensitive photodetection, but their spectral response is intrinsically limited by the silicon bandgap. Extending their operation into the infrared requires the integration of narrow-bandgap absorbers while preserving efficient avalanche multiplication and compatibility with silicon processing. Here, we propose and demonstrate a monolithic approach that combines direct, buffer-free growth of GeSn on silicon with a lateral thin-junction separate-absorption-multiplication architecture. The GeSn layer, with a Sn composition reaching 6 at.%, extends optical absorption to a wavelength of $2.6~\mu$m, while avalanche multiplication is spatially confined to an ion-implanted silicon lateral junction. This separation enables independent control of infrared absorption and carrier multiplication without the thick Ge virtual substrates conventionally used for GeSn epitaxy. GeSn-on-Si avalanche photodiodes exhibit low pre-breakdown dark current, stable breakdown at 72 V independent of device diameter, and clear infrared photoresponse extending beyond $2~\mu$m. At 78 K, the devices exhibit external quantum efficiency exceeding 100%, reaching 163% at $1.55~\mu$m, providing direct evidence of avalanche multiplication. These results establish direct integration of narrow-bandgap group-IV absorbers with silicon multiplication regions as a scalable strategy for extending the spectral reach of silicon avalanche photodetection, opening a route toward monolithic infrared detectors for sensing, imaging, communications, LiDAR, and quantum photonics

physics.optics↗

arXiv2025

Nuclear spin-free 70Ge/28Si70Ge quantum well heterostructures grown on industrial SiGe-buffered wafers

The coherence of hole spin qubits in germanium planar heterostructures is limited by the hyperfine coupling to the nuclear spin bath due to 29Si and 73Ge isotopes. Thus, removing these nuclear spin-full isotopes is essential to extend the hyperfine-limited coherence times needed to implement robust quantum processors. This work demonstrates the epitaxial growth of device-grade nuclear spin-free 70Ge/28Si70Ge heterostructures on industrial SiGe buffers while minimizing the amounts of highly purified 70GeH4 and 28SiH4 used. The obtained 70Ge/28Si70Ge heterostructures exhibit a dislocation density of 5.3 x 10e6 cm-2 and an isotopic purity exceeding 99.99%, with carbon and oxygen impurities below the detection sensitivity, as revealed by atom probe tomography. Magnetotransport measurements on gated Hall bars demonstrate effective gate control of hole density in nuclear spin-free quantum wells. Negative threshold gate voltages confirm the absence of intentional doping in the wells, while Hall and Shubnikov-de Haas analyses yield consistent carrier densities (1.4 x 10e11 cm-2) and high mobilities (2.4 x 10e5 cm2/Vs). Mobility trends reveal interfacetrap- limited scattering and percolation concentration below 7 x 10e10 cm-2. These analyses, along with atomic-level studies, confirm the high quality of epitaxial 70Ge/28Si70Ge heterostructures and their relevance as a platform for long-coherence spin qubits.

cond-mat.mtrl-sci↗

arXiv2023

Nuclear Spin-Depleted, Isotopically Enriched 70Ge/28Si70Ge Quantum Wells

The p-symmetry of the hole wavefunction is associated with a weaker hyperfine interaction as compared to electrons, thus making hole spin qubits attractive candidates to implement long coherence quantum processors. However, recent studies demonstrated that hole qubits in planar germanium (Ge) heterostructures are still very sensitive to nuclear spin bath. These observations highlight the need to develop nuclear spin-free Ge qubits to suppress this decoherence channel and evaluate its impact. With this perspective, this work demonstrates the epitaxial growth of $^\text{73}$Ge-depleted isotopically enriched $^\text{70}$Ge/SiGe quantum wells. The growth was achieved by reduced pressure chemical vapor deposition using isotopically purified monogermane $^\text{70}$GeH$_\text{4}$ and monosilane $^\text{28}$SiH$_\text{4}$ with an isotopic purity higher than 99.9 $\%$ and 99.99 $\%$, respectively. The quantum wells consist of a series of $^\text{70}$Ge/SiGe heterostructures grown on Si wafers using a Ge virtual substrate and a graded SiGe buffer layer. The isotopic purity is investigated using atom probe tomography following an analytical procedure addressing the discrepancies in the isotopic content caused by the overlap of isotope peaks in mass spectra. The nuclear spin background in the quantum wells was found to be sensitive to the growth conditions. The lowest concentration of nuclear spin-full isotopes $^\text{73}$Ge and $^\text{29}$Si in the heterostructure was established at 0.01 $\%$ in the Ge quantum well and SiGe barriers. The measured average distance between nuclear spins reaches 3-4 nm in $^\text{70}$Ge/$^\text{28}$Si$^\text{70}$Ge, which is an order of magnitude larger than in natural Ge/SiGe heterostructures.

cond-mat.mes-hall↗