arXiv · 1410.8693
Nanomorphology of Annealed P3HS and P3HS:PCBM Films for OPV Applications
Abstract
Atomic Force Microscopy (AFM) and Grazing Incidence X-Ray Diffraction (GI-XRD) are used to characterize the nanomorphology of spin-coated low (LMW, Mn = 12 kg/mol, regioregularity RR = 84%) and high (HMW, Mn = 39 kg/mol, RR = 98%) molecular weight poly(3-hexylselenophene) (P3HS) films and blend films of P3HS with [6,6]-phenyl-C61-butyric acid methyl ester (PCBM), before and after thermal annealing at 250 {\deg}C.
Explore related subjects
Keep this discovery
Samuele Lilliu, Mejd Alsari, Marcus S. Dahlem, J. Emyr Macdonald. 2014-10-31. Nanomorphology of Annealed P3HS and P3HS:PCBM Films for OPV Applications. https://arxiv.org/abs/1410.8693
Cite the original work for its findings. Save a collection to share your selection of sources.