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arXiv · 1411.1614

Study of magnetic iron nitride thin films deposited by high power impulse magnetron sputtering

Akhil Tayal·Mukul Gupta·Ajay Gupta·V. Ganesan·Layanta Behera·Surendra Singh·Saibal Basu
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Abstract

In this work, we studied phase formation, structural and magnetic properties of iron-nitride (Fe-N) thin films deposited using high power impulse magnetron sputtering (HiPIMS) and direct current magnetron sputtering (dc-MS). The nitrogen partial pressure during deposition was systematically varied both in HiPIMS and dc-MS. Resulting Fe-N films were characterized for their microstructure, magnetic properties and nitrogen concentration. We found that HiPIMS deposited Fe-N films show a globular nanocrystalline microstructure and improved soft magnetic properties. In addition, it was found that the nitrogen reactivity impedes in HiPIMS as compared to dc-MS. Obtained results can be understood in terms of distinct plasma properties of HiPIMS.

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Akhil Tayal, Mukul Gupta, Ajay Gupta, V. Ganesan, Layanta Behera, Surendra Singh, Saibal Basu. 2014-11-22. Study of magnetic iron nitride thin films deposited by high power impulse magnetron sputtering. https://arxiv.org/abs/1411.1614

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