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arXiv · 1411.2026

Resistance noise at the metal-insulator transition in thermochromic VO2 films

Zareh Topalian·Shu-Yi Li·Gunnar Niklasson·Claes-Goran Granqvist·Laszlo B. Kish
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Abstract

Thermochromic VO2 films were prepared by reactive DC magnetron sputtering onto heated sapphire substrates and were used to make 100-nm-thick samples that were 10 μm wide and 100 micron long. The resistance of these samples changed by a factor of about 2000 in the 50 < Ts < 70 C range of temperature Ts around the "critical" temperature Tc between a low-temperature semiconducting phase and a high-temperature metallic-like phase of VO2. Power density spectra S(f) were extracted for resistance noise around Tc and demonstrated unambiguous 1/f behavior. Data on S(10Hz)/Rs^2 scaled as Rs^x, where Rs is sample resistance; the noise exponent x was -2.6 for Ts < Tc and +2.6 for Ts > Tc. These exponents can be reconciled with the Pennetta-Trefan-Reggiani theory [C. Pennetta, G. Trefanan, and L. Reggiani, Phys. Rev. Lett. 85, 5238 (2000)] for lattice percolation with switching disorder ensuing from random defect generation and healing in steady state. Our work hence highlights the dynamic features of the percolating semiconducting and metallic-like regions around Tc in thermochromic VO2 films.

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Zareh Topalian, Shu-Yi Li, Gunnar Niklasson, Claes-Goran Granqvist, Laszlo B. Kish. 2014-11-07. Resistance noise at the metal-insulator transition in thermochromic VO2 films. https://doi.org/10.1063/1.4905739

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