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arXiv · 1710.07923

Tailoring electronic properties of multilayer phosphorene by siliconization

Oleksandr I. Malyi·Kostiantyn V. Sopiha·Ihor Radchenko·Ping Wu·Clas Persson
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Abstract

Controlling a thickness dependence of electronic properties for two-dimensional (2d) materials is among primary goals for their large-scale applications. Herein, employing a first-principles computational approach, we predict that Si interaction with multilayer phosphorene (2d-P) can result in the formation of highly stable 2d-SiP and 2d-SiP$_2$ compounds with a weak interlayer interaction. Our analysis demonstrates that these systems are semiconductors with band gap energies that can be governed by varying the thickness and stacking order. Specifically, siliconization of phosphorene allows to design 2d-SiP$_x$ materials with significantly weaker thickness dependence of electronic properties than that in 2d-P and to develop ways for their tailoring. We also reveal the spatial dependence of electronic properties for 2d-SiP$_x$ highlighting difference in effective band gaps for different layers. Particularly, our results show that central layers in the multilayer 2d systems determine overall electronic properties, while the role of the outermost layers is noticeably smaller.

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Oleksandr I. Malyi, Kostiantyn V. Sopiha, Ihor Radchenko, Ping Wu, Clas Persson. 2017-12-04. Tailoring electronic properties of multilayer phosphorene by siliconization. https://doi.org/10.1039/c7cp06196j

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