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arXiv · 1907.08347

Homoepitaxial growth of SrTiO$_3$ by Pulsed Laser Deposition: energetic vs thermal growth

Jeffrey G. Ulbrandt·Xiaozhi Zhang·Rui Liu·Kenneth Evans-Lutterodt·Matthew Dawber·Randall L. Headrick
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Abstract

Pulsed Laser Deposition (PLD) is widely used to grow epitaxial thin films of quantum materials such as complex oxides. Here, we use in-situ X-ray scattering to study homoepitaxy of SrTiO$_3$ by energetic (e-) and thermalized (th-) PLD. We find that e-PLD suppresses the lateral growth of two-dimensional islands, which suggests that energetic particles break up smaller islands. Fast interlayer transport occurs for both e-PLD and th-PLD, implying a process operating on sub-microsecond timescales that doesn't depend strongly on the kinetic energy of the incident particles.

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Jeffrey G. Ulbrandt, Xiaozhi Zhang, Rui Liu, Kenneth Evans-Lutterodt, Matthew Dawber, Randall L. Headrick. 2019-07-19. Homoepitaxial growth of SrTiO$_3$ by Pulsed Laser Deposition: energetic vs thermal growth. https://doi.org/10.1103/physrevb.101.241406

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