Probing Emergent Surface and Interfacial Properties in Complex Oxides via in situ X-ray Photoelectron Spectroscopy

Abstract

Emergent behavior at complex oxide interfaces has driven much of the research in the oxide thin film community for the past twenty years. Interfaces have been engineered for potential applications in spintronics, topological quantum computing, and high-speed electronics in cases where the bulk materials would not exhibit the desired properties. Advances in thin film growth have made the synthesis of these interfaces possible, while surface characterization tools such as X-ray photoelectron spectroscopy have been critical to understanding surface and interfacial phenomena in these materials. In this review we discuss the leading research in the oxide field over the past 5-10 years with a focus on connecting the key results to the X-ray photoelectron spectroscopy studies that enabled them. We describe how in situ integration of synthesis and spectroscopy can be used to improve the film growth process and to perform immediate experiments on specifically tailored interfacial heterostructures. These studies can include determination of interfacial intermixing, valence band alignment, and interfacial charge transfer. We also show how advances in synchrotron-based spectroscopy techniques have answered questions that cannot be addressed in a lab-based system. By further tying together synthesis and spectroscopy through in situ techniques, we conclude by discussing future opportunities in the field through the careful design of thin film heterostructures that are optimized for X-ray studies.