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arXiv · 2010.01846

Soft x-ray irradiation induced metallization of layered TiNCl

Noriyuki Kataoka·Masashi Tanaka·Wataru Hosoda·Takumi Taniguchi·Shin-ichi Fujimori·Takanori Wakita·Yuji Muraoka·Takayoshi Yokoya
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Abstract

We have performed soft x-ray spectroscopy in order to study the photoirradiation time dependence of the valence band structure and chemical states of layered transition metal nitride chloride TiNCl. Under the soft x-ray irradiation, the intensities of the states near the Fermi level (EF) and the Ti3+ component increased, while the Cl 2p intensity decreased. Ti 2p-3d resonance photoemission spectroscopy confirmed a distinctive Fermi edge with Ti 3d character. These results indicate the photo-induced metallization originates from deintercalation due to Cl desorption, and thus provide a new carrier doping method that controls the conducting properties of TiNCl.

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Noriyuki Kataoka, Masashi Tanaka, Wataru Hosoda, Takumi Taniguchi, Shin-ichi Fujimori, Takanori Wakita, Yuji Muraoka, Takayoshi Yokoya. 2020-10-05. Soft x-ray irradiation induced metallization of layered TiNCl. https://doi.org/10.1088/1361-648x%2Fabbbc3

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