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arXiv · 2403.12845

Giant electrode effect on tunneling magnetoresistance and electroresistance in van der Waals intrinsic multiferroic tunnel junctions using VS2

Zhi Yan·Ruixia Yang·Cheng Fang·Wentian Lu·Xiaohong Xu
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Abstract

Van der Waals multiferroic tunnel junctions (vdW-MFTJs) with multiple nonvolatile resistive states are highly suitable for new physics and next-generation storage electronics. However, currently reported vdW-MFTJs are based on two types of materials, i.e., vdW ferromagnetic and ferroelectric materials, forming a multiferroic system. This undoubtedly introduces additional interfaces, increasing the complexity of experimental preparation. Herein, we engineer vdW intrinsic MFTJs utilizing bilayer VS$_2$. By employing the nonequilibrium Green's function combined with density functional theory, we systematically investigate the influence of three types of electrodes (including non-vdW pure metal Ag/Au, vdW metallic 1T-MoS$_2$/2H-PtTe$_2$, and vdW ferromagnetic metallic Fe$_3$GaTe$_2$/Fe$_3$GeTe$_2$) on the electronic transport properties of VS$_2$-based intrinsic MFTJs. We demonstrate that these MFTJs manifest a giant electrode-dependent electronic transport characteristic effect. Comprehensively comparing these electrode pairs, the Fe$_3$GaTe$_2$/Fe$_3$GeTe$_2$ electrode combination exhibits optimal transport properties, the maximum TMR (TER) can reach 10949\% (69\%) and the minimum resistance-area product (RA) is 0.45 $Ω$$μ$m$^{2}$, as well as the perfect spin filtering and negative differential resistance effects. More intriguingly, TMR (TER) can be further enhanced to 34000\% (380\%) by applying an external bias voltage (0.1 V), while RA can be reduced to 0.16 $Ω$$μ$m$^{2}$ under the influence of biaxial stress (-3\%). Our proposed concept of designing vdW-MFTJs using intrinsic multiferroic materials points towards new avenues in experimental exploration.

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Zhi Yan, Ruixia Yang, Cheng Fang, Wentian Lu, Xiaohong Xu. 2024-05-07. Giant electrode effect on tunneling magnetoresistance and electroresistance in van der Waals intrinsic multiferroic tunnel junctions using VS2. https://doi.org/10.1103/physrevb.109.205409

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