Atomic short-range order: a new degree of freedom for band engineering of GeSn semiconductor alloys

Shang Liu; Yunfan Liang; Nirosh M. Eldose; Shunda Chen; Xiaochen Jin; Haochen Zhao; Manoj Shah; Jin-Hee Bae; Omar Concepcion; Fernando M. de Oliveira; Ilias Bikmukhametov; Xiaoxin Wang; Yuping Zeng; Dan Buca; Mansour Mortazavi; Damien West; Shengbai Zhang; Tianshu Li; Gregory J. Salamo; Shui-Qing Yu; Jifeng Liu

arXiv · 2407.02767

Atomic short-range order: a new degree of freedom for band engineering of GeSn semiconductor alloys

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Abstract

Chemical short-range order (SRO) in alloys denotes the statistical preference or avoidance between atomic species on neighboring lattice sites. Here, we highlight SRO as a powerful new mechanism for semiconductor alloy band engineering. Atom probe tomography reveals a significantly higher probability of Sn-Sn first nearest neighbors (1NNs) in thin-film GeSn alloys grown by molecular beam epitaxy (MBE) vs. chemical vapor deposition (CVD). Remarkably, although lower Sn concentration typically widens the bandgap, we find that the stronger presence of Sn-Sn 1NN pairs in MBE samples overrides this trend, resulting in a narrower bandgap despite having 2 at.\% lower Sn content than CVD samples. First-principles modeling corroborates this effect, attributing these SRO variations to distinctive surface terminations and growth temperatures between MBE and CVD. These findings establish SRO as a new degree of freedom for semiconductor band engineering beyond composition, strain, and quantum confinement, unlocking novel device mechanisms for the post-Moore era.

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Shang Liu, Yunfan Liang, Nirosh M. Eldose, Shunda Chen, Xiaochen Jin, Haochen Zhao, Manoj Shah, Jin-Hee Bae, Omar Concepcion, Fernando M. de Oliveira, Ilias Bikmukhametov, Xiaoxin Wang, Yuping Zeng, Dan Buca, Mansour Mortazavi, Damien West, Shengbai Zhang, Tianshu Li, Gregory J. Salamo, Shui-Qing Yu, Jifeng Liu. 2024-07-03. Atomic short-range order: a new degree of freedom for band engineering of GeSn semiconductor alloys. https://arxiv.org/abs/2407.02767

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