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arXiv · 2411.06947

Focused ion beam polishing based optimization of high-Q silica microdisk resonators

Abstract

Whispering gallery mode (WGM) microdisk resonators are promising optical devices that confine light efficiently and enable enhanced nonlinear optical effects. This work presents a novel approach to reduce sidewall roughness in SiO\textsubscript{2} microdisk resonators using focused ion beam (FIB) polishing. The microdisks, with varying diameter ranging from 5 to 20 $μ$m are fabricated using a multi-step fabrication scheme. However, the etching process introduces significant sidewall roughness, which increases with decreasing microdisk radius, degrading the resonators' quality. To address this issue, a FIB system is employed to polish the sidewalls, using optimized process parameters to minimize Ga ion implantation. White light interferometry measurements reveal a significant reduction in surface roughness from 7 nm to 20 nm for a 5 $μ$m diameter microdisk, leading to a substantial enhancement in the scattering quality factor (Qss) from $3\times 10^2$ to $2\times 10^6$. These findings demonstrate the effectiveness of FIB polishing in improving the quality of microdisk resonators and open up new possibilities for the fabrication of advanced photonic devices.

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Lekshmi Eswaramoorthy, Parul Sharma, Brijesh Kumar, Abhay Anand V S, Anuj Kumar Singh, Kishor Kumar Mandal, Sudha Mokkapati, Anshuman Kumar. 2024-11-11. Focused ion beam polishing based optimization of high-Q silica microdisk resonators. https://arxiv.org/abs/2411.06947

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