Search arXiv⌕ Search

arXiv · 2503.15961

Valley Emission and Upconversion in Isotopically Engineered Monolayer WS$_2$ under Resonant Excitation

Abstract

In the quest to optimize the optoelectronic and valleytronic properties of 2D materials, various strategies such as strain engineering, doping, and heterostructuring have been explored. In this direction, isotope engineering also offers a potential avenue to alter electron-phonon interaction and impact quasiparticle scattering processes. In this study, we investigate the dependence of sulfur isotopes on upconversion and valley scattering phenomena by collecting the resonance photoluminescence (PL) under an applied magnetic field from 0 to 14 T at 4 K for the chemical vapor deposition-grown monolayer (1L) of W$^{N}$S$_2$, W$^{32}$S$_2$, and W$^{34}$S$_2$. The upconversion of the mixed-state sulfur 1L (W$^{N}$S$_2$) exhibits one M-phonon absorption, with an obtained optical gain of nearly 30 meV, while the pure sulfur isotope labelled 1Ls (W$^{32}$S$_2$ and W$^{34}$S$_2$) require two phonons (M and $Γ$), yielding a gain of around 80 meV. It is also found that the exciton degree of polarization (DOP) of W$^{N}$S$_2$ changes significantly by $\sim$ -30$\%$ as the field increases from 0 to 14 T, while for W$^{32}$S$_2$ and W$^{34}$S$_2$, the exciton DOP increases by up to $\sim$ 8$\%$. Similarly, distinct changes in the DOP are observed for trions and localized excitons among all the samples, attributed to the different valley scattering phenomena. The 1L W$^{N}$S$_2$ demonstrates a combination of intraband and interband scattering, whereas in the case of W$^{32}$S$_2$ intraband scattering is preferred; W$^{34}$S$_2$ predominantly exhibits interband scattering. Finally, a phenomenological model is proposed to describe the upconversion and valley scattering processes.

Explore related subjects

Keep this discovery

Explore connections, maps & timelines

BibTeXRIS

Rahul Kesarwani, Vaibhav Varade, Artur Slobodeniuk, Martin Kalbac, Jana Vejpravova. 2025-03-20. Valley Emission and Upconversion in Isotopically Engineered Monolayer WS$_2$ under Resonant Excitation. https://doi.org/10.1088/2053-1583%2Fadc27d

Cite the original work for its findings. Save a collection to share your selection of sources.

KEEP EXPLORING

Related papers

Surface effects on the plasmons in two-dimemsional heterostructures: Application to tilted semi-Dirac materials

We derived closed-form analytic expressions for the plasmon dispersion equations for two and three monolayers embedded in a non-uniform dielectric medium with a surface. There is no electron tunneling between the layers or hybridization of the layer polarizability. The dispersion equations are deduced from calculated expressions for the corresponding surface response functions (SRFs) generated by a frequency-dependent external polarized electromagnetic field. The SRF is calculated by employing Maxwell's equations in conjunction with linear response theory.The dispersion functions reduce to well-known results for two and three monolayers embedded in a bulk medium with a uniform dielectric background. We examine the role played by a surface (i.e., homogeneous versus inhomogeneous dielectric background screening), for gapped tilted semi-Dirac materials (TSDMs) with half-linear, half-parabolic spectrums whose energy bands are tilted, anisotropic in wave vector space, and a gap is induced. The number of plasmon branches is always equal to the number of monolayer. However, the separation between these branches depends on the distance between the layers and crucially on the chosen dielectric material between the layers and whether there is air or a substrate surrounding the layered structure. For gapped TSDM, the Landau damping, i.e., Plasmon lifetime, varies from branch to branch as well as along the branch for a chosen wave vector direction. We examine these novel behaviors for two and three gapped TSDM monolayers assuming different values for the dielectric background. Our results could be useful for comparing theory with experimental data from electron energy loss spectroscopy (EELS) data.

cond-mat.mes-hall↗

Microscopic Modeling of Surface Roughness Scattering in Inversion Layers of MOSFETs Based on Ando's Linear Model

Surface roughness (SR) scattering in inversion layers of bulk-MOSFETs is studied from the atomistic and quantum-mechanical viewpoints. Contrary to the usual macroscopic landscape of the roughness deviation, we introduce a stochastic deviation at each atomic site to take account of the discontinuity of the spatial derivatives of the electrostatic potential and wave-function at the semiconductor/dielectric interface, leading to an ambiguity in roughness positions. It is shown that SR parameters are consistent with those known from the experiments and, thus, there is no discrepancy problem associated with the roughness parameters in our model. The self-consistent scattering rate is derived under the framework of the Green's functions scheme: We find that the SR scattering rates are intrinsically nonlocal (non-diagonal) with respect to subband indices and greatly deviate from those based on Fermi's golden rule in the regimes of strong effective fields and/or low electron energies. As a result, the conventional SR model tends to underestimate the surface-roughness-limited mobility.

cond-mat.mes-hall↗

Comparative Evaluation of Encapsulation Methods for Endohedral Doping of Single-Wall Carbon Nanotubes

Single wall carbon nanotubes (SWCNTs) are promising building blocks for nanoelectronic and optoelectronic devices, yet reliable and stable doping, particularly n type, remains challenging due to strong environmental sensitivity and competing extrinsic effects. Encapsulation of charge transfer molecules within the SWCNT cavity offers a promising route to stable doping while preserving the nanotubes outer surface for subsequent processing. Here, we systematically investigate the filling of arc discharge SWCNTs with the electron donor tetrathiafulvalene and electron acceptor tetracyanoquinodimethane, comparing different methods for filling, including melt filling, solution reflux, and vacuum phase sublimation. We follow the entire processing workflow from raw, unfilled powders to aqueous dispersions and employ density gradient ultracentrifugation to separate filled from empty nanotubes as well as metallic from semiconducting ones. Encapsulation efficiency and electronic modification are assessed using absorption spectroscopy, resonant Raman scattering, thermogravimetric analysis, X-ray photoelectron spectroscopy and electron paramagnetic resonance. Finally, we introduce a complementary vacuum-phase method that removes externally adsorbed molecules without extensive solvent washing, enabling cleaner encapsulated systems.

cond-mat.mes-hall↗