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arXiv · 2505.04636

Advancing Antiferromagnetic Nitrides via Metal Alloy Nitridation

Qianying Wang·Zexu He·Lele Zhang·Qian Li·Haitao Hong·Ting Cui·Dongke Rong·Songhee Choi·Qiao Jin·Chen Ge·Can Wang·Qinghua Zhang·Liang Cheng·Jingbo Qi·Kui-juan Jin·Gang-Qin Liu·Er-Jia Guo
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Abstract

Nitride materials, valued for their structural stability and exceptional physical properties, have garnered significant interest in both fundamental research and technological applications. The fabrication of high-quality nitride thin films is essential for advancing their use in microelectronics and spintronics. Yet, achieving single-crystal nitride thin films with excellent structural integrity remains a challenge. Here, we introduce a straightforward yet innovative metallic alloy nitridation technique for the synthesis of stable single-crystal nitride thin films. By subjecting metal alloy thin films to a controlled nitridation process, nitrogen atoms integrate into the lattice, driving structural transformations while preserving high epitaxial quality. Combining nanoscale magnetic imaging with a diamond nitrogen-vacancy (NV) probe, X-ray magnetic linear dichroism, and comprehensive transport measurements, we confirm that the nitridated films exhibit a robust antiferromagnetic character with a zero net magnetic moment. This work not only provides a refined and reproducible strategy for the fabrication of nitride thin films but also lays a robust foundation for exploring their burgeoning device applications.

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Qianying Wang, Zexu He, Lele Zhang, Qian Li, Haitao Hong, Ting Cui, Dongke Rong, Songhee Choi, Qiao Jin, Chen Ge, Can Wang, Qinghua Zhang, Liang Cheng, Jingbo Qi, Kui-juan Jin, Gang-Qin Liu, Er-Jia Guo. 2025-05-08. Advancing Antiferromagnetic Nitrides via Metal Alloy Nitridation. https://arxiv.org/abs/2505.04636

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