Heating of black-Si by microwaves at 2.45 GHz: effect of nano-needle orientation

Abstract

Silicon, which is highly reflective and has negligible absorption at the microwave 2.45 GHz range, can be heated when it is turned into black-Si with a surface texture of nano-needles made by SF6/O2 plasma etching. Microwave heating of flat Si and of black-Si with vertical and with tilted (oriented) nano-needles was compared under identical conditions in a cylindrical TM010 resonator. Samples were placed horizontally on a 150-micrometer-thick cover glass, which standardized their height and position inside the cavity and allowed a common calibration of the radiation thermometer against a K-type thermocouple. Under a stepwise protocol of only 2-3-4 W of microwave power (60 s per step), black-Si with vertical needles reached ~ 260 C, systematically exceeding flat Si (~ 190 C), while black-Si with oriented needles showed a delayed but abrupt onset of heating at 3 W. In situ monitoring of the cavity resonance revealed a 2-3 MHz downshift of the resonance frequency f for all samples, with the drift consistently appearing once the sample temperature exceeded ~ 120 - 150 C, consistent with thermally activated carrier generation in Si. At a given temperature, each sample loads the cavity at a different f and quality factor Q, indicating an orientation-dependent effective permittivity of the nano-needle array, in line with the strong form birefringence of tilted black-Si. Application potential and challenges in the quantitative temperature and permittivity determination are discussed.